D2s

D2S designs and develops software and IPs that facilitate direct write e-beam lithography for the production of SoC integrated circuits. Its platform maximizes existing eBeam technology to reduce mask costs for both low- and high-volume applications. D2S TrueMask solutions enable advanced photomask designs at 28-nm-and-below process nodes using complex shapes for superior wafer quality but within practical write-times using existing eBeam mask writing equipment. D2S is based in San Jose, California.